Introducing the Shiseido D Program Overnight Refining Gel Mask, a revolutionary skincare solution designed to enhance your skin’s natural beauty. This gel mask targets skin beautifying bacteria, providing advanced beauty biotechnology to prevent spots, freckles, acne, and redness. With a potent blend of Tranexamic Acid and Dipotassium Glycyrrhizinate, it deeply moisturizes, resulting in fresh, bright, and clear skin. This clean formulation is free from parabens, alcohol, and artificial fragrances, making it ideal for sensitive skin.

• Whitening & Brightening: Suppresses melanin to prevent spots and freckles, promoting a radiant complexion.
• Deep Moisturization: Infused with powerful hydrators like Sodium Hyaluronic Acid, it penetrates deeply to nourish and rejuvenate your skin.
• Sensitive Skin Friendly: With a low-stimulation design, it’s patch-tested to ensure safety for delicate skin types.

Active Ingredients:
Tranexamic Acid, Dipotassium Glycyrrhizinate

Other Ingredients:
Yeast Extract, Trehalose, Xylitol, Erythritol, Sodium Hyaluronate, Salmon Placenta Extract, Aloe Extract, Odoriko Sou Extract, Trimethylglycine, Diglycerin, Purified Water, 1,3-Propanediol, Propylene Glycol, 1,3-Butylene Glycol, α-Olefin Oligomer, Methylpolysiloxane, Polyoxyethylene (17) Polyoxypropylene (4) Dimethyl Ether, Polyoxyethylene Glyceryl Ether, Pentaerythrityl Tetraethylhexanoate, Cetyl Ethylhexanoate, Petrolatum, Behenyl Alcohol, Hydrogenated Oil, Crosslinked N,N-Dimethylacrylamide/2-Acrylamido-2-Methylpropane Sulfonic Acid Copolymer, Carbomer, Batyl Alcohol, Sodium Metabisulfite, Potassium Hydroxide, N-Lauroyl-L-Glutamate (Phytosteryl/2-Octyldodecyl), Sodium Pyrosulfite, Polyoxyethylene (14) Polyoxypropylene (7) Dimethyl Ether, Phenoxyethanol.